Ruff, L.; Kauffmann, J.R.; Vandermeulen, R.A.; Montavon, G.; Samek, W.; Kloft, M.; Dietterich, T.G.; Muller, K.
ArticleIssue Date2021CitationProceedings of the IEEE, v.109, no.5, pp.756 - 795PublisherInstitute of Electrical and Electronics Engineers Inc.