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Impact of proton irradiation on dc performance of AlGaN/GaN high electron mobility transistors

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dc.contributor.authorLiu, Lu-
dc.contributor.authorCuervo, Camilo Velez-
dc.contributor.authorXi, Yuyin-
dc.contributor.authorRen, Fan-
dc.contributor.authorPearton, Stephen J.-
dc.contributor.authorKim, Hong-Yeol-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorKravchenko, Ivan I.-
dc.date.accessioned2021-09-06T00:09:02Z-
dc.date.available2021-09-06T00:09:02Z-
dc.date.created2021-06-14-
dc.date.issued2013-07-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/102809-
dc.description.abstractThe effects of high energy proton irradiation dose on dc performance as well as critical voltage of the drain-voltage step-stress of AlGaN/GaN high electron mobility transistors (HEMTs) were investigated to evaluate the feasibility of AlGaN/GaN HEMTs for space applications, which need to stand a variety of irradiations. The HEMTs were irradiated with protons at a fixed energy of 5 MeV and doses ranging from 10(9) to 2 X 10(14) cm(-2). For the dc characteristics, there was only minimal degradation of saturation drain current (I-DSS), transconductance (g(m)), electron mobility, and sheet carrier concentration at doses below 2 x 10(13) cm(-2), while the reduction of these parameters were 15%, 9%, 41% and 16.6%, respectively, at a dose of 2 x 10(14) cm(-2). At this same dose condition, increases of 37% in drain breakdown voltage (V-BR) and of 45% in critical voltage (V-cri) were observed. The improvements of drain breakdown voltage and critical voltage were attributed to the modification of the depletion region due to the introduction of a higher density of defects after irradiation at a higher dose. (C) 2013 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectNATIVE DEFECTS-
dc.titleImpact of proton irradiation on dc performance of AlGaN/GaN high electron mobility transistors-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.4813785-
dc.identifier.scopusid2-s2.0-84887430578-
dc.identifier.wosid000322379800039-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.31, no.4-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume31-
dc.citation.number4-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusNATIVE DEFECTS-
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