A facile method for highly uniform GaN-based nanorod light-emitting diodes with InGaN/GaN multi-quantum-wells
DC Field | Value | Language |
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dc.contributor.author | Park, Hyunik | - |
dc.contributor.author | Baik, Kwang Hyeon | - |
dc.contributor.author | Kim, Jihyun | - |
dc.contributor.author | Ren, Fan | - |
dc.contributor.author | Pearton, Stephen J. | - |
dc.date.accessioned | 2021-09-06T01:29:14Z | - |
dc.date.available | 2021-09-06T01:29:14Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2013-05-20 | - |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/103216 | - |
dc.description.abstract | We report on a simple and reproducible method for fabricating InGaN/GaN multi-quantum-well (MQW) nanorod light-emitting diodes (LEDs), prepared by combining a SiO2 nanosphere lithography and dryetch process. Focused-ion-beam (FIB)-deposited Pt was contacted to both ends of the nanorod LEDs, producing bright electroluminescence from the LEDs under forward bias conditions. The turn-on voltage in these nanorod LEDs was higher (13 V) than in companion thin film devices (3 V) and this can be attributed to the high contact resistance between the FIB-deposited Pt and nanorod LEDs and the damage induced by inductively-coupled plasma and Ga+ -ions. Our method to obtain uniform MQW nanorod LEDs shows promise for improving the reproducibility of nano-optoelectronics. (C) 2013 Optical Society of America | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | OPTICAL SOC AMER | - |
dc.subject | NANOSPHERE LITHOGRAPHY | - |
dc.subject | SEMICONDUCTOR NANOWIRES | - |
dc.subject | PATTERNED GROWTH | - |
dc.subject | FABRICATION | - |
dc.subject | ARRAYS | - |
dc.subject | NANOPILLARS | - |
dc.title | A facile method for highly uniform GaN-based nanorod light-emitting diodes with InGaN/GaN multi-quantum-wells | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Jihyun | - |
dc.identifier.doi | 10.1364/OE.21.012908 | - |
dc.identifier.scopusid | 2-s2.0-84878596681 | - |
dc.identifier.wosid | 000319339600126 | - |
dc.identifier.bibliographicCitation | OPTICS EXPRESS, v.21, no.10, pp.12908 - 12913 | - |
dc.relation.isPartOf | OPTICS EXPRESS | - |
dc.citation.title | OPTICS EXPRESS | - |
dc.citation.volume | 21 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 12908 | - |
dc.citation.endPage | 12913 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.subject.keywordPlus | NANOSPHERE LITHOGRAPHY | - |
dc.subject.keywordPlus | SEMICONDUCTOR NANOWIRES | - |
dc.subject.keywordPlus | PATTERNED GROWTH | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | NANOPILLARS | - |
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