Fabrication of Nanosized Antireflection Patterns on Surface of Aspheric Lens Substrate by Nanoimprint Lithography

Abstract

Currently, various techniques are being explored for fabricating nano- or microsized patterns on flat and curved substrates. However, there are only a few techniques that can be used to fabricate nano- to microsized patterns on the surface of aspheric lenses. In this study, nanoimprint lithography (NIL) was used to obtain nanosized antireflection structures on the surface of aspheric lenses. In order to ensure conformal contact between the imprint mould and the aspheric lens substrate, a highly flexible poly(urethane acrylate) (PUA)-based film mould was used. As a result, various nanosized patterns were uniformly fabricated on the surface of the aspheric lens with high fidelity. (c) 2013 The Japan Society of Applied Physics