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Penetration depth profiling of proton-irradiated 4H-SiC at 6 MeV and 8 MeV by micro-Raman spectroscopy

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dc.contributor.authorKim, Hong-Yeol-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorFreitas, Jaime A., Jr.-
dc.date.accessioned2021-09-06T02:43:40Z-
dc.date.available2021-09-06T02:43:40Z-
dc.date.created2021-06-14-
dc.date.issued2013-04-01-
dc.identifier.issn0169-4332-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/103532-
dc.description.abstract4H-SiC samples irradiated with high energy protons were probed by low temperature photoluminescence (PL) and room temperature micro-Raman scattering spectroscopies. The quench of the near band-edge emission and the presence of a number of new sharp lines in the luminescence spectra of the proton-irradiated samples confirm the formation of various new defects. The changes of the line-shape and peak position of the longitudinal optical phonon-plasmon coupled (LOPC) mode in 4H-SiC are consistent with the decrease in the free carrier concentrations due to the introduction of carrier traps induced by the high energy proton irradiation. The estimated penetration depths for 6 and 8 MeV energy proton were 180 mu m and 300 mu m, respectively, which are in good agreement with the Monte Carlo numerical simulation results. At the 180 mu m and 300 mu m depths, the carrier concentrations were reduced by approximately 34% and 21%, respectively. (c) 2012 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectPHOTOLUMINESCENCE SPECTROSCOPY-
dc.subjectSILICON-CARBIDE-
dc.subjectN-GAN-
dc.subjectELECTRON-
dc.subjectDEFECTS-
dc.subjectSEMICONDUCTORS-
dc.subjectRADIATION-
dc.subjectSCATTERING-
dc.subjectDAMAGE-
dc.subject4H-
dc.titlePenetration depth profiling of proton-irradiated 4H-SiC at 6 MeV and 8 MeV by micro-Raman spectroscopy-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1016/j.apsusc.2012.12.014-
dc.identifier.scopusid2-s2.0-84875221522-
dc.identifier.wosid000316790200007-
dc.identifier.bibliographicCitationAPPLIED SURFACE SCIENCE, v.270, pp.44 - 48-
dc.relation.isPartOfAPPLIED SURFACE SCIENCE-
dc.citation.titleAPPLIED SURFACE SCIENCE-
dc.citation.volume270-
dc.citation.startPage44-
dc.citation.endPage48-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusPHOTOLUMINESCENCE SPECTROSCOPY-
dc.subject.keywordPlusSILICON-CARBIDE-
dc.subject.keywordPlusN-GAN-
dc.subject.keywordPlusELECTRON-
dc.subject.keywordPlusDEFECTS-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusRADIATION-
dc.subject.keywordPlusSCATTERING-
dc.subject.keywordPlusDAMAGE-
dc.subject.keywordPlus4H-
dc.subject.keywordAuthor4H-SiC-
dc.subject.keywordAuthorProton irradiation-
dc.subject.keywordAuthorRaman spectroscopy-
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