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Carbon nanotubes for interconnects in VLSI integrated circuits

Authors
Siegmar RothU. Dettlaf-Weglikows
Issue Date
10월-2008
Publisher
WILEY-V C H VERLAG GMBH
Citation
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS VOLUME: 245 ISSUE: 10, v.245, no.10, pp.2303 - 2307
Indexed
SCOPUS
Journal Title
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS VOLUME: 245 ISSUE: 10
Volume
245
Number
10
Start Page
2303
End Page
2307
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/104617
ISSN
0370-1972
Abstract
The paper reviews the requirements for carbon nanotubes to be used as interconnects in VLSI integrated circuits. It describes the production by chemical vapour deposition of high density arrays of nanotubes suitable for use as interconnects, and describes their characterisation by Raman and transmission electron microscopy. (C) 2008 WILEY-VCH Verlag GmbH Co. KGaA, Weinheim
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