An Integrated Mach-Zehnder Interferometric Sensor Fabricated by Using Cr Mask Extension Lithography
- Authors
- Choo, Sung Joong; Park, Jung Ho; Lee, Sangyoup; Shin, Hyun-Joon
- Issue Date
- 3월-2012
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Mach-Zehnder interferometric chip; Rib waveguide; Silicon-oxynitride; Chromium mask layer; Image reversal process
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.60, no.5, pp.744 - 749
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 60
- Number
- 5
- Start Page
- 744
- End Page
- 749
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/105394
- DOI
- 10.3938/jkps.60.744
- ISSN
- 0374-4884
- Abstract
- An integrated Mach-Zehnder interferometric chip operating at 632.8 nm was designed and fabricated using planar rib waveguide technology for optical sensor applications. A rib waveguide with a silicon-oxynitride core layer and silicon-oxide clad layers was geometrically designed to have a single-mode operation and a high surface sensitivity by using an effective index method. A chromium mask layer was employed as an etch stop to protect the core layer of the rib waveguide and was patterned using an image reversal process with a photo mask applied to the sensor zone. The image reversal process was modified in order to obtain a longer chromium mask layer against the sensor zone. We have, therefore, established a fabrication method for an integrated Mach-Zehnder interferometric sensor without the addition of a new photo mask. The optical measurement with this device for a mixture of deionized water (DIW) and phosphate buffer solution (PBS) finally showed a sensitivity of about pi/(6.25 x 10(-4)).
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