Super-resolution Optical Measurement of Nanoscale Photoacid Distribution in Lithographic Materials
DC Field | Value | Language |
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dc.contributor.author | Berro, Adam J. | - |
dc.contributor.author | Berglund, Andrew J. | - |
dc.contributor.author | Carmichael, Peter T. | - |
dc.contributor.author | Kim, Jong-Seung | - |
dc.contributor.author | Liddle, J. Alexander | - |
dc.date.accessioned | 2021-09-06T13:58:15Z | - |
dc.date.available | 2021-09-06T13:58:15Z | - |
dc.date.created | 2021-06-14 | - |
dc.date.issued | 2012-11 | - |
dc.identifier.issn | 1936-0851 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/107117 | - |
dc.description.abstract | We demonstrate a method using photoactivation localization microscopy (PALM) in a soft-material system, with a rhodamine-lactam dye that is activated by both ultraviolet light and protonation, to reveal the nanoscale photoacid distribution in a model photoresist. Chemically amplified resists are the principal lithographic materials used in the semiconductor industry. The photoacid distribution generated upon exposure and its subsequent evolution during post-exposure bake is a major limiting factor in determining the resolution and lithographic quality of the final developed resist image. Our PALM data sets resolve the acid distribution in a latent Image with subdiffraction limit accuracy. Our overall accuracy is currently limited by residual mechanical drift. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | POLYMER PHOTORESISTS | - |
dc.subject | RESOLUTION | - |
dc.subject | SPECTROSCOPY | - |
dc.subject | MICROSCOPY | - |
dc.subject | RESIST | - |
dc.subject | FRONT | - |
dc.title | Super-resolution Optical Measurement of Nanoscale Photoacid Distribution in Lithographic Materials | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Jong-Seung | - |
dc.identifier.doi | 10.1021/nn304285m | - |
dc.identifier.scopusid | 2-s2.0-84870468400 | - |
dc.identifier.wosid | 000311521700017 | - |
dc.identifier.bibliographicCitation | ACS NANO, v.6, no.11, pp.9496 - 9502 | - |
dc.relation.isPartOf | ACS NANO | - |
dc.citation.title | ACS NANO | - |
dc.citation.volume | 6 | - |
dc.citation.number | 11 | - |
dc.citation.startPage | 9496 | - |
dc.citation.endPage | 9502 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | POLYMER PHOTORESISTS | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | SPECTROSCOPY | - |
dc.subject.keywordPlus | MICROSCOPY | - |
dc.subject.keywordPlus | RESIST | - |
dc.subject.keywordPlus | FRONT | - |
dc.subject.keywordAuthor | single-molecule fluorescence | - |
dc.subject.keywordAuthor | super-resolution microscopy | - |
dc.subject.keywordAuthor | chemically amplified resist | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordAuthor | photoacid | - |
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