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Super-resolution Optical Measurement of Nanoscale Photoacid Distribution in Lithographic Materials

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dc.contributor.authorBerro, Adam J.-
dc.contributor.authorBerglund, Andrew J.-
dc.contributor.authorCarmichael, Peter T.-
dc.contributor.authorKim, Jong-Seung-
dc.contributor.authorLiddle, J. Alexander-
dc.date.accessioned2021-09-06T13:58:15Z-
dc.date.available2021-09-06T13:58:15Z-
dc.date.created2021-06-14-
dc.date.issued2012-11-
dc.identifier.issn1936-0851-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/107117-
dc.description.abstractWe demonstrate a method using photoactivation localization microscopy (PALM) in a soft-material system, with a rhodamine-lactam dye that is activated by both ultraviolet light and protonation, to reveal the nanoscale photoacid distribution in a model photoresist. Chemically amplified resists are the principal lithographic materials used in the semiconductor industry. The photoacid distribution generated upon exposure and its subsequent evolution during post-exposure bake is a major limiting factor in determining the resolution and lithographic quality of the final developed resist image. Our PALM data sets resolve the acid distribution in a latent Image with subdiffraction limit accuracy. Our overall accuracy is currently limited by residual mechanical drift.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER CHEMICAL SOC-
dc.subjectPOLYMER PHOTORESISTS-
dc.subjectRESOLUTION-
dc.subjectSPECTROSCOPY-
dc.subjectMICROSCOPY-
dc.subjectRESIST-
dc.subjectFRONT-
dc.titleSuper-resolution Optical Measurement of Nanoscale Photoacid Distribution in Lithographic Materials-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jong-Seung-
dc.identifier.doi10.1021/nn304285m-
dc.identifier.scopusid2-s2.0-84870468400-
dc.identifier.wosid000311521700017-
dc.identifier.bibliographicCitationACS NANO, v.6, no.11, pp.9496 - 9502-
dc.relation.isPartOfACS NANO-
dc.citation.titleACS NANO-
dc.citation.volume6-
dc.citation.number11-
dc.citation.startPage9496-
dc.citation.endPage9502-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.subject.keywordPlusPOLYMER PHOTORESISTS-
dc.subject.keywordPlusRESOLUTION-
dc.subject.keywordPlusSPECTROSCOPY-
dc.subject.keywordPlusMICROSCOPY-
dc.subject.keywordPlusRESIST-
dc.subject.keywordPlusFRONT-
dc.subject.keywordAuthorsingle-molecule fluorescence-
dc.subject.keywordAuthorsuper-resolution microscopy-
dc.subject.keywordAuthorchemically amplified resist-
dc.subject.keywordAuthorlithography-
dc.subject.keywordAuthorphotoacid-
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