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Buried graphene electrodes on GaN-based ultra-violet light-emitting diodes

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dc.contributor.authorKim, Byung-Jae-
dc.contributor.authorLee, Chongmin-
dc.contributor.authorMastro, Michael A.-
dc.contributor.authorHite, Jennifer K.-
dc.contributor.authorEddy, Charles R., Jr.-
dc.contributor.authorRen, Fan-
dc.contributor.authorPearton, Stephen J.-
dc.contributor.authorKim, Jihyun-
dc.date.accessioned2021-09-06T17:40:56Z-
dc.date.available2021-09-06T17:40:56Z-
dc.date.created2021-06-18-
dc.date.issued2012-07-16-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/107922-
dc.description.abstractWe report that the oxidation of graphene-based highly transparent conductive layers to AlGaN/GaN/AlGaN ultra-violet (UV) light-emitting diodes (LEDs) was suppressed by the use of SiNX passivation layers. Although graphene is considered to be an ideal candidate as the transparent conductive layer to UV-LEDs, oxidation of these layers at high operating temperatures has been an issue. The oxidation is initiated at the un-saturated carbon atoms at the edges of the graphene and reduces the UV light intensity and degrades the current-voltage (I-V) characteristics. The oxidation also can occur at defects, including vacancies. However, GaN-based UV-LEDs deposited with SiNX by plasma-enhanced chemical vapor deposition showed minimal degradation of light output intensity and I-V characteristics because the graphene-based UV transparent conductive layers were shielded from the oxygen molecules. This is a simple and effective approach for maintaining the advantages of graphene conducting layers as electrodes on UV-LEDs. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4733981]-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.subjectSINGLE-LAYER-
dc.titleBuried graphene electrodes on GaN-based ultra-violet light-emitting diodes-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1063/1.4733981-
dc.identifier.scopusid2-s2.0-84864261690-
dc.identifier.wosid000306748000008-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.101, no.3-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume101-
dc.citation.number3-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSINGLE-LAYER-
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