Control of the free carrier concentrations in a Si-doped freestanding GaN grown by hydride vapor phase epitaxy
DC Field | Value | Language |
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dc.contributor.author | Park, Hyun Jong | - |
dc.contributor.author | Kim, Hong-Yeol | - |
dc.contributor.author | Bae, Jun Young | - |
dc.contributor.author | Shin, Seonghwan | - |
dc.contributor.author | Kim, Jihyun | - |
dc.date.accessioned | 2021-09-06T17:51:45Z | - |
dc.date.available | 2021-09-06T17:51:45Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2012-07-01 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/107954 | - |
dc.description.abstract | Freestanding GaN was grown on sapphire substrate in a horizontal HVPE system, followed by laser lift-off process. The thickness of the freestanding GaN samples was about 350 mu m. Si was used as an n-type dopant and the carrier concentrations were non-destructively measured by micro-Raman spectroscopy. The carrier concentrations of GaN samples were changed from 0.62 to 3.7 x 10(18)/cm(3) by varying the Si/Ga ratios from 0.01 to 0.04. Crystalline quality of the freestanding GaN was characterized by X-ray diffraction (XRD). The full-width at half-maximum (FWHM) values of the rocking curves of the (102) plane was changed from 96.9 to 317.5 arcsec depending on Si/Ga ratios. This work provides Si/Ga ratios to obtain various carrier concentrations of the freestanding GaN by HVPE, and proposes micro-Raman spectroscopy as a sensitive technique for carrier concentration measurement. (C) 2011 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | RAMAN-SCATTERING | - |
dc.subject | HVPE | - |
dc.subject | SPECTROSCOPY | - |
dc.subject | CRYSTALS | - |
dc.subject | STRESS | - |
dc.subject | FILMS | - |
dc.title | Control of the free carrier concentrations in a Si-doped freestanding GaN grown by hydride vapor phase epitaxy | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Jihyun | - |
dc.identifier.doi | 10.1016/j.jcrysgro.2011.12.029 | - |
dc.identifier.wosid | 000304457800019 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CRYSTAL GROWTH, v.350, no.1, pp.85 - 88 | - |
dc.relation.isPartOf | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.title | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.volume | 350 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 85 | - |
dc.citation.endPage | 88 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Crystallography | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Crystallography | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | RAMAN-SCATTERING | - |
dc.subject.keywordPlus | HVPE | - |
dc.subject.keywordPlus | SPECTROSCOPY | - |
dc.subject.keywordPlus | CRYSTALS | - |
dc.subject.keywordPlus | STRESS | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | Doping | - |
dc.subject.keywordAuthor | Hydride vapor phase epitaxy | - |
dc.subject.keywordAuthor | GaN | - |
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