Nano-Scale Texturing of Borosilicate Glasses Using CF4-Based Plasma Discharge for Application in Thin Film Solar Cells
- Authors
- Kim, Hyung Soo; Lim, Jung Wook; Yun, Sun Jin; Lee, Heon; Lee, Hee Chul
- Issue Date
- 4월-2012
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- Solar Cell; Surface Reflection; Texturing; Plasma Treatment; Borosilicate Glass
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.4, pp.3464 - 3468
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- Volume
- 12
- Number
- 4
- Start Page
- 3464
- End Page
- 3468
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/108837
- DOI
- 10.1166/jnn.2012.5565
- ISSN
- 1533-4880
- Abstract
- Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF4/O-2 and CF4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.