Highly Reliable Ohmic Contacts to N-Polar n-Type GaN for High-Power Vertical Light-Emitting Diodes
DC Field | Value | Language |
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dc.contributor.author | Jeon, Joon-Woo | - |
dc.contributor.author | Lee, Sang Youl | - |
dc.contributor.author | Song, June-O | - |
dc.contributor.author | Seong, Tae-Yeon | - |
dc.date.accessioned | 2021-09-07T05:18:17Z | - |
dc.date.available | 2021-09-07T05:18:17Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2011-12-01 | - |
dc.identifier.issn | 1041-1135 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/110928 | - |
dc.description.abstract | We report on the formation of highly reliable Ti/Al-based Ohmic contacts to N-polar n-GaN for vertical light-emitting diodes via laser-annealing. All as-deposited samples are Ohmic with specific contact resistances of 1.1 - 4.3 x 10(-4) Omega cm(2). After annealing at 250 degrees C, unlike the untreated sample, the laser-annealed samples remain Ohmic with specific contact resistances of 2.6-3.9 x 10(-4) Omega cm(2). The laser-annealed samples remain electrically stable up to 60 min at 300 degrees C. Laser-annealing causes the formation of interfacial TiN/beta-AlN phases with rock salt structure. Based on X-ray photoemission spectroscopy and scanning transmission electron microscopy results, possible Ohmic mechanisms are described. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | ELECTRONIC-PROPERTIES | - |
dc.subject | BAND BENDINGS | - |
dc.subject | RESISTANCE | - |
dc.subject | FACE | - |
dc.title | Highly Reliable Ohmic Contacts to N-Polar n-Type GaN for High-Power Vertical Light-Emitting Diodes | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Seong, Tae-Yeon | - |
dc.identifier.doi | 10.1109/LPT.2011.2169399 | - |
dc.identifier.scopusid | 2-s2.0-81155132366 | - |
dc.identifier.wosid | 000296730200006 | - |
dc.identifier.bibliographicCitation | IEEE PHOTONICS TECHNOLOGY LETTERS, v.23, no.23, pp.1784 - 1786 | - |
dc.relation.isPartOf | IEEE PHOTONICS TECHNOLOGY LETTERS | - |
dc.citation.title | IEEE PHOTONICS TECHNOLOGY LETTERS | - |
dc.citation.volume | 23 | - |
dc.citation.number | 23 | - |
dc.citation.startPage | 1784 | - |
dc.citation.endPage | 1786 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | ELECTRONIC-PROPERTIES | - |
dc.subject.keywordPlus | BAND BENDINGS | - |
dc.subject.keywordPlus | RESISTANCE | - |
dc.subject.keywordPlus | FACE | - |
dc.subject.keywordAuthor | Contact | - |
dc.subject.keywordAuthor | laser annealing | - |
dc.subject.keywordAuthor | light-emitting diodes (LEDs) | - |
dc.subject.keywordAuthor | semiconductor-metal interfaces | - |
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