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Large-area suspended graphene on GaN nanopillars

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dc.contributor.authorLee, Chongmin-
dc.contributor.authorKim, Byung-Jae-
dc.contributor.authorRen, Fan-
dc.contributor.authorPearton, S. J.-
dc.contributor.authorKim, Jihyun-
dc.date.accessioned2021-09-07T06:33:46Z-
dc.date.available2021-09-07T06:33:46Z-
dc.date.created2021-06-19-
dc.date.issued2011-11-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/111220-
dc.description.abstractThe authors have demonstrated large-area suspended graphene on GaN nanopillars predefined by nanosphere lithography and inductively coupled plasma etching. The graphene was successfully suspended over large areas without ripples and corrugations. Scanning electron microscopy, atomic force microscopy and micro-Raman spectroscopy were used to characterize the properties of the suspended graphene on nanopillars. The thermal properties of the suspended and supported graphene were investigated by varying the underlying GaN nanopilllar geometries from flat-top to sharp-cone morphologies and heating the resulting structures via irradiation with laser powers of 1.53 mW, 8.03 mW, and 16.19 mW. The heat transfer was effective even when the contact area between the suspended graphene and the supporting substrate was small, due to the high thermal conductivities of graphene and GaN. The extremely high thermal conductivity of the graphene can improve the thermal management in GaN-based high power electronic and optoelectronics devices, a critical factor for their long-term reliability. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3654042]-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectELECTRON-MOBILITY-
dc.subjectTRANSPARENT-
dc.subjectFILMS-
dc.subjectLAYER-
dc.subjectTRANSPORT-
dc.titleLarge-area suspended graphene on GaN nanopillars-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.3654042-
dc.identifier.scopusid2-s2.0-84255172870-
dc.identifier.wosid000298538800100-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.29, no.6-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume29-
dc.citation.number6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusELECTRON-MOBILITY-
dc.subject.keywordPlusTRANSPARENT-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusLAYER-
dc.subject.keywordPlusTRANSPORT-
dc.subject.keywordAuthoratomic force microscopy-
dc.subject.keywordAuthorgallium compounds-
dc.subject.keywordAuthorgraphene-
dc.subject.keywordAuthorheat transfer-
dc.subject.keywordAuthorIII-V semiconductors-
dc.subject.keywordAuthornanofabrication-
dc.subject.keywordAuthornanolithography-
dc.subject.keywordAuthornanostructured materials-
dc.subject.keywordAuthorradiation effects-
dc.subject.keywordAuthorRaman spectra-
dc.subject.keywordAuthorscanning electron microscopy-
dc.subject.keywordAuthorsputter etching-
dc.subject.keywordAuthorthermal conductivity-
dc.subject.keywordAuthorwide band gap semiconductors-
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