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Polarization and Space-Charge-Limited Current in III-Nitride Heterostructure Nanowires

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dc.contributor.authorMastro, Michael A.-
dc.contributor.authorKim, Hong-Youl-
dc.contributor.authorAhn, Jaehui-
dc.contributor.authorSimpkins, Blake-
dc.contributor.authorPehrsson, Pehr-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorHite, Jennifer K.-
dc.contributor.authorEddy, Charles R., Jr.-
dc.date.accessioned2021-09-07T08:03:03Z-
dc.date.available2021-09-07T08:03:03Z-
dc.date.created2021-06-18-
dc.date.issued2011-10-
dc.identifier.issn0018-9383-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/111540-
dc.description.abstractAn undoped AlGaN/GaN nanowire (NW) demonstrated p-type conductivity solely based on the formation of hole carriers in response to the negative polarization field at the (000-1) AlGaN/GaN facet. A transistor based on this NW displayed a low-voltage transition from ohmic to space-charge-limited conduction. A numerical simulation showed that a highly asymmetric strain exists across the triangular cross section, which creates a doublet peak in the piezoelectric-induced polarization sheet charge at the (000-1) facet. Additionally, there is a strong interplay between the charge at the (000-1) AlGaN/GaN interface with depletion from the three surfaces, as well as an interaction with the opposing polarization fields at two semipolar {-110-1} facets. The charge distribution and resultant conduction regime is highly interdependent on the configuration of the multilayer structure, and it is not amenable to an analytical model.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectINN-
dc.titlePolarization and Space-Charge-Limited Current in III-Nitride Heterostructure Nanowires-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1109/TED.2011.2162108-
dc.identifier.scopusid2-s2.0-80053208197-
dc.identifier.wosid000295100300023-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.58, no.10, pp.3401 - 3406-
dc.relation.isPartOfIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.titleIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.volume58-
dc.citation.number10-
dc.citation.startPage3401-
dc.citation.endPage3406-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusINN-
dc.subject.keywordAuthorGallium nitride-
dc.subject.keywordAuthornanowires (NWs)-
dc.subject.keywordAuthorsemiconductor nanostructures-
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