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Implicit Continuous Current-Voltage Model for Surrounding-Gate Metal-Oxide-Semiconductor Field-Effect Transistors Including Interface Traps

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dc.contributor.authorYu, Yun Seop-
dc.contributor.authorCho, Namki-
dc.contributor.authorHwang, Sung Woo-
dc.contributor.authorAhn, Doyeol-
dc.date.accessioned2021-09-07T09:58:40Z-
dc.date.available2021-09-07T09:58:40Z-
dc.date.created2021-06-19-
dc.date.issued2011-08-
dc.identifier.issn0018-9383-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/111915-
dc.description.abstractAn analytic and continuous direct-current model for cylindrical doped surrounding-gate metal-oxide-semiconductor field-effect transistors (SGMOSFETs) including interface-trap charges is presented. Based on the SGMOSFET model, which is valid from undoped to heavily doped channels, a general model for long-channel SGMOSFETs including interface-trap charges is derived. A comparison between the numerical simulations and analytic calculations showed that the proposed model is valid for all operating regions of SGMOSFETs including different interface-trap charges with several dimensions and doping densities.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectMOSFETS-
dc.subjectCHANNEL-
dc.subjectSTACKS-
dc.titleImplicit Continuous Current-Voltage Model for Surrounding-Gate Metal-Oxide-Semiconductor Field-Effect Transistors Including Interface Traps-
dc.typeArticle-
dc.contributor.affiliatedAuthorHwang, Sung Woo-
dc.identifier.doi10.1109/TED.2011.2156412-
dc.identifier.scopusid2-s2.0-79960847320-
dc.identifier.wosid000293708500040-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.58, no.8, pp.2520 - 2524-
dc.relation.isPartOfIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.titleIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.volume58-
dc.citation.number8-
dc.citation.startPage2520-
dc.citation.endPage2524-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusMOSFETS-
dc.subject.keywordPlusCHANNEL-
dc.subject.keywordPlusSTACKS-
dc.subject.keywordAuthorInterface trap-
dc.subject.keywordAuthorSPICE-
dc.subject.keywordAuthorsurrounding-gate metal-oxide-semiconductor field-effect transistor (SGMOSFET)-
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