Optical and electrical characterization of AlGaN/GaN high electron mobility transistors irradiated with 5 MeV protons
DC Field | Value | Language |
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dc.contributor.author | Kim, Hong-Yeol | - |
dc.contributor.author | Anderson, Travis | - |
dc.contributor.author | Mastro, Michael A. | - |
dc.contributor.author | Freitas, Jaime A., Jr. | - |
dc.contributor.author | Jang, Soohwan | - |
dc.contributor.author | Hite, Jennifer | - |
dc.contributor.author | Eddy, Charles R., Jr. | - |
dc.contributor.author | Kim, Jihyun | - |
dc.date.accessioned | 2021-09-07T10:50:48Z | - |
dc.date.available | 2021-09-07T10:50:48Z | - |
dc.date.created | 2021-06-14 | - |
dc.date.issued | 2011-07-01 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/112029 | - |
dc.description.abstract | An AlGaN/GaN HEMT was irradiated with 5 MeV protons at a dose up to 2 x 10(15)/cm(2). Photoluminescence spectra measured at 5 K indicated that GaN lattice was severely damaged by collisions with high energy protons although distinct near band-edge features were still observable. An I-DS-V-DS measurement showed that the current level was decreased by 43% after proton irradiation, and an I-GS-V-GS measurement suggested that damage at the metal-contact/AlGaN interface was minimal. Transistor operation was found to be resistant to proton irradiation, which was partially attributed to a self-healing mechanism in proximity to the AlGaN/GaN interface. Published by Elsevier B.V. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER | - |
dc.subject | RAMAN-SCATTERING | - |
dc.title | Optical and electrical characterization of AlGaN/GaN high electron mobility transistors irradiated with 5 MeV protons | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Jihyun | - |
dc.identifier.doi | 10.1016/j.jcrysgro.2011.01.052 | - |
dc.identifier.wosid | 000293483800014 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CRYSTAL GROWTH, v.326, no.1, pp.62 - 64 | - |
dc.relation.isPartOf | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.title | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.volume | 326 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 62 | - |
dc.citation.endPage | 64 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Crystallography | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Crystallography | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | RAMAN-SCATTERING | - |
dc.subject.keywordAuthor | Photoluminescence | - |
dc.subject.keywordAuthor | Radiation | - |
dc.subject.keywordAuthor | Semiconducting Gallium Compounds | - |
dc.subject.keywordAuthor | High Electron Mobility Transistor | - |
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