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Etched Surface Morphology of Heteroepitaxial Nonpolar (11(2)over-bar0) and Semipolar (11(2)over-bar2) GaN Films by Photoenhanced Chemical Wet Etching

Authors
Baik, Kwang HyeonSong, Hoo-YoungHwang, Sung-MinJung, YounghunAhn, JaehuiKim, Jihyun
Issue Date
2011
Publisher
ELECTROCHEMICAL SOC INC
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.158, no.4, pp.D196 - D199
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume
158
Number
4
Start Page
D196
End Page
D199
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/114876
DOI
10.1149/1.3544916
ISSN
0013-4651
Abstract
We investigated how selective wet etching changes the surface morphologies of nonpolar a-plane (11 (2) over bar0) and semipolar (11 (2) over bar2) GaN films grown on sapphire substrates. Trigonal prisms with various widths are seen on the top surface and the tapered sidewall facet of the a-plane GaN films along the c-axis direction. Inclined trigonal unit cells are observed on the semipolar (11 (2) over bar2) GaN films after wet etching. The specific crystallographic planes of (10 (1) over bar0), (01 (1) over bar0), and (0001) were exposed in common for both the GaN films, indicating that these planes are chemically stable due to atomic bond configurations and smaller density of atoms. Photoenhanced chemical wet etching proceeds on the a-plane and semipolar GaN films until chemically stable m-plane GaN surfaces as well as c-plane GaN surfaces are exposed. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3544916] All rights reserved.
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