High-performance capacitive humidity sensor with novel electrode and polyimide layer based on MEMS technology
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Ji-Hong | - |
dc.contributor.author | Hong, Sung-Min | - |
dc.contributor.author | Moon, Byung-Moo | - |
dc.contributor.author | Kim, Kunnyun | - |
dc.date.accessioned | 2021-09-07T22:18:32Z | - |
dc.date.available | 2021-09-07T22:18:32Z | - |
dc.date.created | 2021-06-14 | - |
dc.date.issued | 2010-12 | - |
dc.identifier.issn | 0946-7076 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/115155 | - |
dc.description.abstract | A high-performance capacitive humidity sensor based on a newly designed electrode and a polyimide (PI) layer is presented in this paper. The humidity sensor consists of a substrate with a cavity, a bottom electrode, a PI sensing layer, and a comb-shaped top electrode with branches. The cavity structure of the substrate was formed to protect the top electrode. In order to enhance the performance of the sensor, the coated PI layer was etched by using an O-2 plasma asher in accordance with the top electrode passivation. After the PI etching, the humidity sensor showed a high sensitivity of 506 fF/% RH and a fast response time of less than 6 s, which is attributed to the increased contact area between the PI layer and moisture, and shortened moisture absorption path into the PI layer. Further characterizations were carried out to measure the effect of temperature, hysteresis, and stability. The humidity sensor showed a hysteresis of 2.05% RH, little temperature dependence, and stable capacitance value with maximum 0.28% error rate for 24 h. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | SPRINGER HEIDELBERG | - |
dc.subject | FABRICATION | - |
dc.subject | DESIGN | - |
dc.title | High-performance capacitive humidity sensor with novel electrode and polyimide layer based on MEMS technology | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Moon, Byung-Moo | - |
dc.identifier.doi | 10.1007/s00542-010-1139-0 | - |
dc.identifier.scopusid | 2-s2.0-78049468412 | - |
dc.identifier.wosid | 000283512300002 | - |
dc.identifier.bibliographicCitation | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, v.16, no.12, pp.2017 - 2021 | - |
dc.relation.isPartOf | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | - |
dc.citation.title | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | - |
dc.citation.volume | 16 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 2017 | - |
dc.citation.endPage | 2021 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | DESIGN | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.