Epitaxial growth of Cr2O3 thin film on Al2O3 (0001) substrate by radio frequency magnetron sputtering combined with rapid-thermal annealing
DC Field | Value | Language |
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dc.contributor.author | Jeong, Sang-Yong | - |
dc.contributor.author | Lee, Jin-Bok | - |
dc.contributor.author | Na, Hyunseok | - |
dc.contributor.author | Seong, Tae-Yeon | - |
dc.date.accessioned | 2021-09-08T02:04:48Z | - |
dc.date.available | 2021-09-08T02:04:48Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2010-06-30 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/116211 | - |
dc.description.abstract | We prepared epitaxially grown Cr2O3 thin films on Al2O3 (0001) substrate by using radio frequency magnetron sputtering at room temperature followed by a rapid-thermal annealing process. It is shown that the phase and the crystallinity of as-grown samples depend on the flow ratios of the working gas (Ar/O-2). X-ray diffraction (XRD) results show that oxygen-rich CrO3 phase having preferred orientation is formed when sputter-grown at room temperature under the working gas (Ar/O-2) flow ratios of 9:1 and 7:3. XRD Phi-scanning results exhibit that annealing causes the oxygen-rich CrO3 phase to transform into epitaxial Cr2O3 phase, which is confirmed by X-ray photoemission spectroscopy. The samples grown at the gas flow ratio of 9:1 exhibit very smooth surfaces with root mean square roughness of 0.1-0.3 nm. (C) 2010 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | CHROMIUM-OXIDE COATINGS | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | MECHANICAL-PROPERTIES | - |
dc.subject | OPTICAL-PROPERTIES | - |
dc.subject | MICROSTRUCTURE | - |
dc.subject | TEMPERATURE | - |
dc.subject | PARAMETERS | - |
dc.subject | PLASMA | - |
dc.subject | GOLD | - |
dc.subject | SAPPHIRE | - |
dc.title | Epitaxial growth of Cr2O3 thin film on Al2O3 (0001) substrate by radio frequency magnetron sputtering combined with rapid-thermal annealing | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Seong, Tae-Yeon | - |
dc.identifier.doi | 10.1016/j.tsf.2010.01.046 | - |
dc.identifier.scopusid | 2-s2.0-77955664053 | - |
dc.identifier.wosid | 000279566100011 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.518, no.17, pp.4813 - 4816 | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 518 | - |
dc.citation.number | 17 | - |
dc.citation.startPage | 4813 | - |
dc.citation.endPage | 4816 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | CHROMIUM-OXIDE COATINGS | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | MECHANICAL-PROPERTIES | - |
dc.subject.keywordPlus | OPTICAL-PROPERTIES | - |
dc.subject.keywordPlus | MICROSTRUCTURE | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | PARAMETERS | - |
dc.subject.keywordPlus | PLASMA | - |
dc.subject.keywordPlus | GOLD | - |
dc.subject.keywordPlus | SAPPHIRE | - |
dc.subject.keywordAuthor | Chromium Oxide | - |
dc.subject.keywordAuthor | Epitaxial growth | - |
dc.subject.keywordAuthor | Radio frequency magnetron sputtering | - |
dc.subject.keywordAuthor | X-ray diffraction | - |
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