Low Resistance CrB2/Ti/Al Ohmic Contacts to N-face n-GaN for High Power GaN-Based Vertical Light Emitting Diodes
DC Field | Value | Language |
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dc.contributor.author | Park, Seong-Han | - |
dc.contributor.author | Jeon, Joon-Woo | - |
dc.contributor.author | Lee, Sang Youl | - |
dc.contributor.author | Moon, Jihyung | - |
dc.contributor.author | Song, June-O | - |
dc.contributor.author | Seong, Tae-Yeon | - |
dc.date.accessioned | 2021-09-08T09:54:01Z | - |
dc.date.available | 2021-09-08T09:54:01Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2010 | - |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/118519 | - |
dc.description.abstract | We investigated the effect of a CrB2 interlayer on the electrical properties of Ti/Al contacts to N-face n-type GaN for high performance vertical light emitting diodes. Before annealing, both CrB2 (30 nm)/Ti (30 nm)/Al (200 nm) and Ti (30 nm)/Al (200 nm) contacts produce ohmic behaviors with a contact resistivity of 1.92 x 10(-4) and 1.99 x 10(-4) Omega cm(2), respectively. Unlike the Ti/Al contacts, however, the CrB2/Ti/Al contacts remain ohmic with a contact resistivity of 8.30 x 10(-4) Omega cm(2) even after annealing at 250 degrees C for 1 min in N-2 ambient. X-ray photoemission spectroscopy and secondary-ion mass spectrometry examinations are performed to describe the ohmic formation behavior. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3461136] All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.subject | TI/AL CONTACTS | - |
dc.subject | ELECTRICAL CHARACTERISTICS | - |
dc.subject | CRYSTAL-POLARITY | - |
dc.subject | SCHOTTKY DIODES | - |
dc.subject | BAND BENDINGS | - |
dc.subject | MECHANISM | - |
dc.subject | AL | - |
dc.title | Low Resistance CrB2/Ti/Al Ohmic Contacts to N-face n-GaN for High Power GaN-Based Vertical Light Emitting Diodes | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Seong, Tae-Yeon | - |
dc.identifier.doi | 10.1149/1.3461136 | - |
dc.identifier.scopusid | 2-s2.0-77955723726 | - |
dc.identifier.wosid | 000280769700008 | - |
dc.identifier.bibliographicCitation | ELECTROCHEMICAL AND SOLID STATE LETTERS, v.13, no.10, pp.H333 - H335 | - |
dc.relation.isPartOf | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.title | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.volume | 13 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | H333 | - |
dc.citation.endPage | H335 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | TI/AL CONTACTS | - |
dc.subject.keywordPlus | ELECTRICAL CHARACTERISTICS | - |
dc.subject.keywordPlus | CRYSTAL-POLARITY | - |
dc.subject.keywordPlus | SCHOTTKY DIODES | - |
dc.subject.keywordPlus | BAND BENDINGS | - |
dc.subject.keywordPlus | MECHANISM | - |
dc.subject.keywordPlus | AL | - |
dc.subject.keywordAuthor | aluminium | - |
dc.subject.keywordAuthor | annealing | - |
dc.subject.keywordAuthor | chromium compounds | - |
dc.subject.keywordAuthor | electrical resistivity | - |
dc.subject.keywordAuthor | gallium compounds | - |
dc.subject.keywordAuthor | III-V semiconductors | - |
dc.subject.keywordAuthor | light emitting diodes | - |
dc.subject.keywordAuthor | ohmic contacts | - |
dc.subject.keywordAuthor | secondary ion mass spectra | - |
dc.subject.keywordAuthor | semiconductor-metal boundaries | - |
dc.subject.keywordAuthor | titanium | - |
dc.subject.keywordAuthor | wide band gap semiconductors | - |
dc.subject.keywordAuthor | X-ray photoelectron spectra | - |
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