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Secondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography

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dc.contributor.authorLee, Kyu Won-
dc.contributor.authorYoon, S. M.-
dc.contributor.authorLee, S. C.-
dc.contributor.authorLee, W.-
dc.contributor.authorKim, I. -M.-
dc.contributor.authorLee, Cheol Eui-
dc.contributor.authorKim, D. H.-
dc.date.accessioned2021-09-08T13:21:21Z-
dc.date.available2021-09-08T13:21:21Z-
dc.date.created2021-06-11-
dc.date.issued2009-10-
dc.identifier.issn0374-4884-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/119289-
dc.description.abstractWe have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherKOREAN PHYSICAL SOC-
dc.subjectLITHOGRAPHY-
dc.subjectSIMULATION-
dc.subjectPOLYMETHYLMETHACRYLATE-
dc.titleSecondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Cheol Eui-
dc.identifier.doi10.3938/jkps.55.1720-
dc.identifier.scopusid2-s2.0-72149103805-
dc.identifier.wosid000270890500064-
dc.identifier.bibliographicCitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.4, pp.1720 - 1723-
dc.relation.isPartOfJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.titleJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.volume55-
dc.citation.number4-
dc.citation.startPage1720-
dc.citation.endPage1723-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.identifier.kciidART001498041-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Multidisciplinary-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusSIMULATION-
dc.subject.keywordPlusPOLYMETHYLMETHACRYLATE-
dc.subject.keywordAuthorElectron-beam nanolithography-
dc.subject.keywordAuthorSecondary electron generation-
dc.subject.keywordAuthorMonte Carlo simulation-
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