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Analysis of surface dark current dependent upon surface passivation in APD based on GaAs

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dc.contributor.authorSong, Hong Joo-
dc.contributor.authorRoh, Cheong Hyun-
dc.contributor.authorLee, Jun Ho-
dc.contributor.authorChoi, Hong Goo-
dc.contributor.authorKim, Dong Ho-
dc.contributor.authorPark, Jung Ho-
dc.contributor.authorHahn, Cheol-Koo-
dc.date.accessioned2021-09-08T16:18:39Z-
dc.date.available2021-09-08T16:18:39Z-
dc.date.created2021-06-10-
dc.date.issued2009-06-
dc.identifier.issn0268-1242-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/119860-
dc.description.abstractIn this paper, we investigated the dependence of reverse dark current on two types of surface passivation, one of which is polyimide and the other is SiNx, for InAs quantum dots/GaAs separate absorption, charge, multiplication avalanche photodiode (SACM APD). From the experimental results, we found that dark current was dominated by surface current, and not bulk current. It was also noted that SiNx passivation has a surface current that is lower by three to nine times in magnitude than that in polyimide passivation in the whole range of bias. To analyze the difference in dark current due to the passivation types, we propose the theoretical current components. This shows that the dark current of both passivation types is mainly composed of generation-recombination (G-R) and tunneling components, originating from the surface. However, each component has a different magnitude for passivation types, which can be explained by carrier concentration and trap density. The dependence of dark current on temperature shows the different behaviors between passivation types and supports a theoretical description of current components.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIOP PUBLISHING LTD-
dc.subjectCAVITY SEPARATE ABSORPTION-
dc.subjectAVALANCHE PHOTODIODES-
dc.subjectIN0.53GA0.47AS-
dc.subjectPHOTODETECTORS-
dc.subjectFABRICATION-
dc.subjectPOLYIMIDE-
dc.subjectARRAYS-
dc.subjectCHARGE-
dc.titleAnalysis of surface dark current dependent upon surface passivation in APD based on GaAs-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Jung Ho-
dc.identifier.doi10.1088/0268-1242/24/6/065003-
dc.identifier.scopusid2-s2.0-78349236496-
dc.identifier.wosid000266287000011-
dc.identifier.bibliographicCitationSEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.24, no.6-
dc.relation.isPartOfSEMICONDUCTOR SCIENCE AND TECHNOLOGY-
dc.citation.titleSEMICONDUCTOR SCIENCE AND TECHNOLOGY-
dc.citation.volume24-
dc.citation.number6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusCAVITY SEPARATE ABSORPTION-
dc.subject.keywordPlusAVALANCHE PHOTODIODES-
dc.subject.keywordPlusIN0.53GA0.47AS-
dc.subject.keywordPlusPHOTODETECTORS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusPOLYIMIDE-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusCHARGE-
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