Fabrication of roll imprint stamp for continuous UV roll imprinting process
DC Field | Value | Language |
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dc.contributor.author | Hwang, Seon-Yong | - |
dc.contributor.author | Hong, Sung-Hoon | - |
dc.contributor.author | Jung, Ho-Yong | - |
dc.contributor.author | Lee, Heon | - |
dc.date.accessioned | 2021-09-08T18:35:08Z | - |
dc.date.available | 2021-09-08T18:35:08Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2009-04 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/120365 | - |
dc.description.abstract | Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using polyvinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiOx layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp. (C) 2008 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | NM HALF-PITCH | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | SUBSTRATE | - |
dc.subject | RESIN | - |
dc.title | Fabrication of roll imprint stamp for continuous UV roll imprinting process | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1016/j.mee.2008.11.055 | - |
dc.identifier.scopusid | 2-s2.0-67349216732 | - |
dc.identifier.wosid | 000267273300048 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.86, no.4-6, pp.642 - 645 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 86 | - |
dc.citation.number | 4-6 | - |
dc.citation.startPage | 642 | - |
dc.citation.endPage | 645 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | NM HALF-PITCH | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | SUBSTRATE | - |
dc.subject.keywordPlus | RESIN | - |
dc.subject.keywordAuthor | Roll-to-Roll imprint | - |
dc.subject.keywordAuthor | Roll stamp | - |
dc.subject.keywordAuthor | M-PDMS (Methacryloxypropyl terminated poly-dimethylsiloxanes) | - |
dc.subject.keywordAuthor | PVA (poly-vinyl alcohol) | - |
dc.subject.keywordAuthor | Nano imprint lithography | - |
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