Selective placement of single-walled carbon nanotubes on pre-defined micro-patterns on SiO2 surface based on a dry lift-off technique
DC Field | Value | Language |
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dc.contributor.author | Tran, Thu Hong | - |
dc.contributor.author | Lee, Kyong Soo | - |
dc.contributor.author | Lee, Jin Woo | - |
dc.contributor.author | Ju, Byeong-Kwon | - |
dc.date.accessioned | 2021-09-08T21:05:24Z | - |
dc.date.available | 2021-09-08T21:05:24Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2009-01 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/120822 | - |
dc.description.abstract | We reported a new technique for self-assembly of selective placement of carbon nanotubes (CNT) on pre-defined micro-patterns. Our work based on the use of a poly-para-xylylene C passivation layer on silicon dioxide NOD surface which was micro-patterned by reactive ion etching (RIE) process and follow by the CNT deposition step. The lift-off of poly-para-xylylene layer then was carried out relying on a dry lift-off method in order to remove the nanotubes adsorbed on the poly-para-xylylene layer leaving the CNT on the desirable areas. CNT located at specific micro-areas with pre-defined patterns from 50 mu m down to less than 10 mu m line width and variable shapes. This approach provides a simple and useful means allow controlled placement of CNT which is necessary for the large-scale fabrication of electronic devices. (C) 2008 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | CONTROLLED DEPOSITION | - |
dc.title | Selective placement of single-walled carbon nanotubes on pre-defined micro-patterns on SiO2 surface based on a dry lift-off technique | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Jin Woo | - |
dc.contributor.affiliatedAuthor | Ju, Byeong-Kwon | - |
dc.identifier.doi | 10.1016/j.cap.2008.08.047 | - |
dc.identifier.scopusid | 2-s2.0-55649090319 | - |
dc.identifier.wosid | 000262500500012 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.9, pp.S38 - S42 | - |
dc.relation.isPartOf | CURRENT APPLIED PHYSICS | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 9 | - |
dc.citation.startPage | S38 | - |
dc.citation.endPage | S42 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART001326107 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | CONTROLLED DEPOSITION | - |
dc.subject.keywordAuthor | Nanomaterial | - |
dc.subject.keywordAuthor | Poly-para-xylylene C | - |
dc.subject.keywordAuthor | Dry lift-off removal | - |
dc.subject.keywordAuthor | Deposition | - |
dc.subject.keywordAuthor | Micro-scale patterns | - |
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