Synthesis of novel platinum precursor and its application to metal organic chemical vapor deposition of platinum thin films
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Sun Sook | - |
dc.contributor.author | Lee, Ho-Min | - |
dc.contributor.author | Park, Min-Jung | - |
dc.contributor.author | An, Ki-Seok | - |
dc.contributor.author | Kim, Jinkwon | - |
dc.contributor.author | Lee, Jong-Heun | - |
dc.contributor.author | Chung, Taek-Mo | - |
dc.contributor.author | Kim, Chang Gyoun | - |
dc.date.accessioned | 2021-09-09T05:35:29Z | - |
dc.date.available | 2021-09-09T05:35:29Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2008-08 | - |
dc.identifier.issn | 0253-2964 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/122924 | - |
dc.description.abstract | A novel platinum aminoalkoxide complex, Pt(dmamp)(2) has been prepared by the reaction of cis-(py)(2)PtI2 with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)(2) complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)(2). As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 mu Omega cm) of Pt film deposited at 400 degrees C is a little higher than the bulk value (10.5 mu Omega cm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | MOCVD | - |
dc.subject | LAYER | - |
dc.subject | TEMPERATURE | - |
dc.subject | MECHANISMS | - |
dc.subject | CVD | - |
dc.subject | SI | - |
dc.title | Synthesis of novel platinum precursor and its application to metal organic chemical vapor deposition of platinum thin films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Jong-Heun | - |
dc.identifier.scopusid | 2-s2.0-50449096247 | - |
dc.identifier.wosid | 000259292000013 | - |
dc.identifier.bibliographicCitation | BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.29, no.8, pp.1491 - 1494 | - |
dc.relation.isPartOf | BULLETIN OF THE KOREAN CHEMICAL SOCIETY | - |
dc.citation.title | BULLETIN OF THE KOREAN CHEMICAL SOCIETY | - |
dc.citation.volume | 29 | - |
dc.citation.number | 8 | - |
dc.citation.startPage | 1491 | - |
dc.citation.endPage | 1494 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART001524983 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.subject.keywordPlus | MOCVD | - |
dc.subject.keywordPlus | LAYER | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | MECHANISMS | - |
dc.subject.keywordPlus | CVD | - |
dc.subject.keywordPlus | SI | - |
dc.subject.keywordAuthor | platinum | - |
dc.subject.keywordAuthor | precursor | - |
dc.subject.keywordAuthor | MOCVD | - |
dc.subject.keywordAuthor | aminoalkoxide | - |
dc.subject.keywordAuthor | thin films | - |
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