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Fabrication and characterization of pentacene-based transistors with a room-temperature mobility of 1.25 cm(2)/Vs

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dc.contributor.authorSeo, Hoon-Seok-
dc.contributor.authorJang, Young-Se-
dc.contributor.authorZhang, Ying-
dc.contributor.authorAbthagir, P. Syed-
dc.contributor.authorChoi, Jong-Ho-
dc.date.accessioned2021-09-09T05:49:38Z-
dc.date.available2021-09-09T05:49:38Z-
dc.date.created2021-06-10-
dc.date.issued2008-08-
dc.identifier.issn1566-1199-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/122987-
dc.description.abstractPentacene-based transistors produced by a novel neutral cluster beam deposition method were characterized, and the effects of the surface pretreatments were examined. Atomic force microscopy and X-ray diffraction showed that the cluster beams were quite efficient in growing high-quality, crystalline thin films on SiO2 substrates at room-temperature without any thermal post-treatment, and that an amphiphilic surfactant, octadecyltrichlorosilane (OTS), enhances the packing density and crystallinity significantly. The observed field-effect mobilities (mu(eff)) were among the best reported thus far: 0.47 and 1.25 cm(2)/Vs for the OTS-untreated and -pretreated devices, respectively. The device performance was found to be consistent with the estimated trap density and activation energy, which were derived from the transport characteristics for the temperature dependence of mu(eff) in the range of 10-300 K. (C) 2008 Published by Elsevier B.V.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectTHIN-FILM TRANSISTORS-
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectBEAM DEPOSITION METHODS-
dc.subjectPULSED-LASER DEPOSITION-
dc.subjectGATE DIELECTRICS-
dc.subjectDEVICES-
dc.subjectPERFORMANCE-
dc.subjectLAYER-
dc.titleFabrication and characterization of pentacene-based transistors with a room-temperature mobility of 1.25 cm(2)/Vs-
dc.typeArticle-
dc.contributor.affiliatedAuthorChoi, Jong-Ho-
dc.identifier.doi10.1016/j.orgel.2008.01.008-
dc.identifier.scopusid2-s2.0-44149088078-
dc.identifier.wosid000257211600003-
dc.identifier.bibliographicCitationORGANIC ELECTRONICS, v.9, no.4, pp.432 - 438-
dc.relation.isPartOfORGANIC ELECTRONICS-
dc.citation.titleORGANIC ELECTRONICS-
dc.citation.volume9-
dc.citation.number4-
dc.citation.startPage432-
dc.citation.endPage438-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusBEAM DEPOSITION METHODS-
dc.subject.keywordPlusPULSED-LASER DEPOSITION-
dc.subject.keywordPlusGATE DIELECTRICS-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusLAYER-
dc.subject.keywordAuthorpentacene-
dc.subject.keywordAuthorneutral cluster beam deposition (NCBD)-
dc.subject.keywordAuthororganic thin-film transistor-
dc.subject.keywordAuthoroctadecyltrichlorosilane (OTS)-
dc.subject.keywordAuthortemperature dependence of field-effect mobility (mu(eff))-
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