Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hong, Sung-Hoon | - |
dc.contributor.author | Han, Kang-Soo | - |
dc.contributor.author | Byeon, Kyeong-Jae | - |
dc.contributor.author | Lee, Heon | - |
dc.contributor.author | Choi, Kyung-Woo | - |
dc.date.accessioned | 2021-09-09T08:49:57Z | - |
dc.date.available | 2021-09-09T08:49:57Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2008-05 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/123635 | - |
dc.description.abstract | As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699] | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | JAPAN SOCIETY APPLIED PHYSICS | - |
dc.subject | IMPRINT LITHOGRAPHY | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | TEMPLATE | - |
dc.subject | MOLD | - |
dc.title | Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1143/JJAP.47.3699 | - |
dc.identifier.scopusid | 2-s2.0-55049128077 | - |
dc.identifier.wosid | 000256462500082 | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.5, pp.3699 - 3701 | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 47 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 3699 | - |
dc.citation.endPage | 3701 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | TEMPLATE | - |
dc.subject.keywordPlus | MOLD | - |
dc.subject.keywordAuthor | curved substrate | - |
dc.subject.keywordAuthor | flexible stamp | - |
dc.subject.keywordAuthor | nickel foil stamp | - |
dc.subject.keywordAuthor | hot embossing | - |
dc.subject.keywordAuthor | nanoimprint | - |
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