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Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

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dc.contributor.authorByeon, Kyeong-Jae-
dc.contributor.authorHwang, Seon-Yong-
dc.contributor.authorLee, Heon-
dc.date.accessioned2021-09-09T09:09:42Z-
dc.date.available2021-09-09T09:09:42Z-
dc.date.issued2008-05-
dc.identifier.issn0167-9317-
dc.identifier.issn1873-5568-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/123708-
dc.description.abstractA two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region. (C) 2007 Elsevier B.V. All rights reserved.-
dc.format.extent4-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE BV-
dc.titleFabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography-
dc.typeArticle-
dc.publisher.location네덜란드-
dc.identifier.doi10.1016/j.mee.2007.12.078-
dc.identifier.scopusid2-s2.0-44349135685-
dc.identifier.wosid000257413400024-
dc.identifier.bibliographicCitationMICROELECTRONIC ENGINEERING, v.85, no.5-6, pp 830 - 833-
dc.citation.titleMICROELECTRONIC ENGINEERING-
dc.citation.volume85-
dc.citation.number5-6-
dc.citation.startPage830-
dc.citation.endPage833-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaOptics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryOptics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusLIGHT-EMITTING-DIODES-
dc.subject.keywordPlusIMPRINTING LITHOGRAPHY-
dc.subject.keywordPlusWAFER-
dc.subject.keywordPlusITO-
dc.subject.keywordAuthortransparent conducting oxide (TCO) layer-
dc.subject.keywordAuthorindium tin oxide (ITO)-
dc.subject.keywordAuthornanoimprint lithography (NIL)-
dc.subject.keywordAuthorphotonic crystals-
dc.subject.keywordAuthorpatterned transparent electrode-
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