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Optical characteristics and the linewidth enhancement factor measured from InAs/GaAs quantum dot laser diodes

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dc.contributor.authorKim, Kyoung Chan-
dc.contributor.authorHan, Il Ki-
dc.contributor.authorYoo, Young Chae-
dc.contributor.authorLee, Jung Il-
dc.contributor.authorSung, Yun Mo-
dc.contributor.authorKim, Tae Geun-
dc.date.accessioned2021-09-09T10:46:38Z-
dc.date.available2021-09-09T10:46:38Z-
dc.date.created2021-06-10-
dc.date.issued2008-03-
dc.identifier.issn1536-125X-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/123988-
dc.description.abstractWe report the optical characteristics and the linewidth enhancement factor (a-factor) of InAs/GaAs quantum dot (QD) laser diodes (LDs) with a 5-mu m-wide stripe and 1-mm-long cavity. Continuous wave (CW) operation of the laser yielded a kink-free output power of 160 mW with an external efficiency of 0.35 W/A. The threshold current was 28 mA and the lasing occurred at 1286 nm, solely at the ground state (GS) up to a current of 345 mA, without switching to the excited state (ES). Then, to estimate the a-factor of the LDs, we investigated the differential gain and wavelength shift versus the current. The differential gain was 2.37 cm(-1)/mA at 1286 nm, and the wavelength shift was 0.00046 nm/mA, which resulted in an alpha-factor of 0.057 at 1286 nm. The a-factor decreased with increasing wavelength. To the best of our knowledge, this is the lowest value of the alpha-factor that has been reported so far, indicating that our QD-LD has excellent beam quality under high-power operation due to the elimination of the filamentation.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectROOM-TEMPERATURE-
dc.subjectSEMICONDUCTOR-LASERS-
dc.subjectWELL LASERS-
dc.subjectGAIN-
dc.titleOptical characteristics and the linewidth enhancement factor measured from InAs/GaAs quantum dot laser diodes-
dc.typeArticle-
dc.contributor.affiliatedAuthorSung, Yun Mo-
dc.contributor.affiliatedAuthorKim, Tae Geun-
dc.identifier.doi10.1109/TNANO.2008.914978-
dc.identifier.wosid000254029500009-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON NANOTECHNOLOGY, v.7, no.2, pp.135 - 139-
dc.relation.isPartOfIEEE TRANSACTIONS ON NANOTECHNOLOGY-
dc.citation.titleIEEE TRANSACTIONS ON NANOTECHNOLOGY-
dc.citation.volume7-
dc.citation.number2-
dc.citation.startPage135-
dc.citation.endPage139-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusROOM-TEMPERATURE-
dc.subject.keywordPlusSEMICONDUCTOR-LASERS-
dc.subject.keywordPlusWELL LASERS-
dc.subject.keywordPlusGAIN-
dc.subject.keywordAuthordifferential gain-
dc.subject.keywordAuthorlaser diodes (LDs)-
dc.subject.keywordAuthorlinewidth enhancement factor-
dc.subject.keywordAuthorquantum dot (QD)-
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