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Core Circuit Technologies for PN-Diode-Cell PRAM

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dc.contributor.author강해복-
dc.contributor.author홍석경-
dc.contributor.author홍성주-
dc.contributor.author성만영-
dc.contributor.author최복길-
dc.contributor.author정진용-
dc.date.accessioned2021-09-09T14:59:38Z-
dc.date.available2021-09-09T14:59:38Z-
dc.date.created2021-06-17-
dc.date.issued2008-
dc.identifier.issn1598-1657-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/125081-
dc.description.abstractPhase-change random access memory (PRAM) chip cell phase of amorphous state is rapidly changed to crystal state above 160 Celsius degree within several seconds during Infrared (IR)reflow. Thus, on-board programming method is considered for PRAM chip programming. We demonstrated the functional 512Mb PRAM with 90nm technology using several novel core circuits, such as metal-2 line based global row decoding scheme, PN-diode cells based BL discharge (BLDIS) scheme, and PMOS switch based column decoding scheme. The reversestate standby current of each PRAM cell is near 10 pA range. The total leak current of 512Mb PRAM chip in standby mode on discharging state can be more than 5 mA. Thus in the proposed BLDIS control, all bitlines (BLs) are in floating state in standby mode, then in active mode, the activated BLs are discharged to low level in the early timing of the active period by the short pulse BLDIS control timing operation. In the conventional sense amplifier, the simultaneous switching activation timing operation invokes the large coupling noise between the VSAREF node and the inner amplification nodes of the sense amplifiers. The coupling noise at VSAREF degrades the sensing voltage margin of the conventional sense amplifier. The merit of the proposed sense amplifier is almost removing the coupling noise at VSAREF from sharing with other sense amplifiers.-
dc.languageEnglish-
dc.language.isoen-
dc.publisher대한전자공학회-
dc.titleCore Circuit Technologies for PN-Diode-Cell PRAM-
dc.title.alternativeCore Circuit Technologies for PN-Diode-Cell PRAM-
dc.typeArticle-
dc.contributor.affiliatedAuthor성만영-
dc.identifier.bibliographicCitationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.8, no.2, pp.128 - 133-
dc.relation.isPartOfJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.citation.titleJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.citation.volume8-
dc.citation.number2-
dc.citation.startPage128-
dc.citation.endPage133-
dc.type.rimsART-
dc.identifier.kciidART001357807-
dc.description.journalClass2-
dc.description.journalRegisteredClasskci-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthorPRAM-
dc.subject.keywordAuthorNVRAM-
dc.subject.keywordAuthorFeRAM-
dc.subject.keywordAuthorMRAM-
dc.subject.keywordAuthorGST (Ge2Sb2Te5)-
dc.subject.keywordAuthorSET-
dc.subject.keywordAuthorRESET-
dc.subject.keywordAuthorGBL-
dc.subject.keywordAuthorGXDEC-
dc.subject.keywordAuthorBL discharge (BLDIS)-
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