Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale
- Authors
- Oh, Jinwoo; Shin, Minkyung; Kim, In Soo; Suh, Hyo Seon; Kim, YongJoo; Kim, Jai Kyeong; Bang, Joona; Yeom, Bongjun; Son, Jeong Gon
- Issue Date
- 25-5월-2021
- Publisher
- AMER CHEMICAL SOC
- Keywords
- directed self-assembly; block copolymer; shear-rolling; directional alignment; sub-10 nm patterning; filtered plasma; perpendicular orientation
- Citation
- ACS NANO, v.15, no.5, pp.8549 - 8558
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS NANO
- Volume
- 15
- Number
- 5
- Start Page
- 8549
- End Page
- 8558
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/128006
- DOI
- 10.1021/acsnano.1c00358
- ISSN
- 1936-0851
- Abstract
- Shear alignment of the block copolymer (BCP) thin film is one of the promising directed self-assembly (1)SA) methodologies for the unidirectional alignment of sub-10 nm microdomains of BCPs for next-generation nanolithography and nanowire-grid polarizers. However, because of the differences in the surface/interfacial energies at the top surface/bottom interface, the shear-induced ordering of BCP nanopatterns has been restricted to BCPs with spherical and cylindrical nanopatterns and cannot be realized for high-aspect-ratio perpendicular lamellar structures, which is essential for practical application to semiconductor pattern processes. It is still a difficult challenge to fabricate the unidirectional alignment in a short time over a large area. In this study, we propose an approach for combining the shear-rolling process with the filtered plasma treatment of BCP films for the fabrication of unidirectionally aligned and perpendicularly oriented lamellar nanostructures. This approach enables fabrication within 1 min on a 4 in scale. We treated filtered plasma on the BCP film for perpendicular orientation and executed the hot-rolling process with different roller and stage speeds. Large-scale shear was generated only at the location where the BCP film was in contact with both the roller and stage, effectively applying shear stress to a large area of the BCP film within a short time. The repeated application of this shear-rolling process can achieve a higher level of unidirectional alignment. Our aligned BCP vertical lamellae were used to fabricate a high-aspect-ratio sub-10-nm-wide metallic nanowire array via dry/wet processes. In addition, shear-rolling with chemoepitaxy patterns can achieve higher orientational order and lower defectivity.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.