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Improved Reliability of 278 nm Deep Ultraviolet AlGaN-Based Flip-Chip Light Emitting Diodes by Using ITO/Al Contact

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dc.contributor.authorYum, Woong-Sun-
dc.contributor.authorLee, Sang-Youl-
dc.contributor.authorLim, Hyun-Soo-
dc.contributor.authorChoi, Rak-Jun-
dc.contributor.authorOh, Jeong-Tak-
dc.contributor.authorJeong, Hwan-Hee-
dc.contributor.authorSeong, Tae-Yeon-
dc.date.accessioned2021-11-21T20:40:37Z-
dc.date.available2021-11-21T20:40:37Z-
dc.date.created2021-08-30-
dc.date.issued2021-04-01-
dc.identifier.issn2162-8769-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/128275-
dc.description.abstractWe investigated the electrical and optical performance and reliability of 278 nm deep ultraviolet (DUV) AlGaN-based flip-chip light-emitting diodes (FCLEDs) fabricated with ITO/Al and reference Ni/Au contacts. The DUV FCLEDs with the Ni/Au and ITO/Al contacts yielded forward voltages of 6.52 and 6.65 V at 50 A cm(-2) and light output of 6.36 and 10.06 mW at 50 A cm(-2), respectively. The ITO/Al-based FCLEDs produced higher Wall plug efficiency (WPE) (3.04% at 50 A cm(-2)) than the Ni/Au-based samples (1.96%). The ITO/Al-based FCLEDs revealed 55% higher WPE at 50 A cm(-2) than the Ni/Au-based sample. For both of the samples, the output power decreased with increasing operation time at 100 A cm(-2). For example, after 2000 h, the Ni/Au and ITO/Al-based FCLEDs showed a reduction in the output power by 37% and 22%, respectively. Despite the good output characteristics, the ITO/Al contact-based FCLEDs exhibited higher forward bias voltages than the Ni/Au-based sample. Based on the energy dispersive X-ray spectroscopy (EDS) depth profiles, high-angle annular dark field (HAADF), and electron energy loss spectroscopy (EELS) results, reason for the increase in the forward voltage of ITO/Al-based FCLEDs is described and discussed.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELECTROCHEMICAL SOC INC-
dc.titleImproved Reliability of 278 nm Deep Ultraviolet AlGaN-Based Flip-Chip Light Emitting Diodes by Using ITO/Al Contact-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1149/2162-8777/abf0e9-
dc.identifier.scopusid2-s2.0-85104764832-
dc.identifier.wosid000639552800001-
dc.identifier.bibliographicCitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.10, no.4-
dc.relation.isPartOfECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.titleECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.volume10-
dc.citation.number4-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordAuthorDeep ultraviolet light-emitting diode-
dc.subject.keywordAuthorAlGaN contact layer-
dc.subject.keywordAuthorITO-
dc.subject.keywordAuthorAl-
dc.subject.keywordAuthorNi-
dc.subject.keywordAuthorAu-
dc.subject.keywordAuthorcontact-
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공과대학 (신소재공학부)
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