Portable UV nanoimprint lithography system using hydraulic pressure

Abstract

Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultraviolet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 mu m, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.