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Self-powered solar-blind alpha-Ga2O3 thin-film UV-C photodiode grown by halide vapor-phase epitaxy

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dc.contributor.authorBae, Jinho-
dc.contributor.authorPark, Ji-Hyeon-
dc.contributor.authorJeon, Dae-Woo-
dc.contributor.authorKim, Jihyun-
dc.date.accessioned2022-03-03T19:41:20Z-
dc.date.available2022-03-03T19:41:20Z-
dc.date.created2022-03-02-
dc.date.issued2021-10-01-
dc.identifier.issn2166-532X-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/137659-
dc.description.abstractA compact self-powered solar-blind UV-C photodiode was demonstrated using an ultra-wide bandgap (UWBG) alpha-Ga2O3 thin film as a wavelength-selective absorber layer. The UWBG-based Schottky junction architecture renders the use of low-performance and bulky solarblind UV bandpass filters unnecessary. High-quality alpha-Ga2O3 thin films with a thickness of 1.25 mu mwere grown on a (0001) sapphire substrate via the halide vapor-phase epitaxy technique. The self-powered solar-blind UV-C photodetector based on the Ni/alpha-Ga2O3 Schottky junction exhibited excellent responsivity (1.17 x 10(-4) A/W), photo-to-dark current ratio (1.12 x 105), and reproducibility, as well as fast rise/decay characteristics without persistent photoconductivity upon exposure to UV-C radiation (254 nm wavelength). The relationship between light intensity (I) and photocurrent (P) was modeled by I x P-0.69, indicating the high-quality of the halide vapor-phase epitaxy-grown alpha-Ga2O3 thin film. Upon exposure to natural sunlight, the fabricated solar-blind photodetector showed excellent solar blindness with sensitivity to UV-C radiation and did not require an external power source. Therefore, this UWBG alpha-Ga2O3 thin-film Schottky barrier photodiode is expected to facilitate the development of a compact and energy-independent next-generation UV-C photodetector with solar blindness. (C) 2021 Author(s).-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAIP Publishing-
dc.subjectPHOTODETECTOR-
dc.subjectPERFORMANCE-
dc.subjectALPHA-
dc.titleSelf-powered solar-blind alpha-Ga2O3 thin-film UV-C photodiode grown by halide vapor-phase epitaxy-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1063/5.0067133-
dc.identifier.scopusid2-s2.0-85117158528-
dc.identifier.wosid000754460900009-
dc.identifier.bibliographicCitationAPL MATERIALS, v.9, no.10-
dc.relation.isPartOfAPL MATERIALS-
dc.citation.titleAPL MATERIALS-
dc.citation.volume9-
dc.citation.number10-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusPHOTODETECTOR-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusALPHA-
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