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Improved performance of deep ultraviolet AlGaN-based light-emitting diode by reducing contact resistance of Al-based reflector

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dc.contributor.authorSim, Kee-Baek-
dc.contributor.authorJin, Jun-Young-
dc.contributor.authorKim, Su-Kyung-
dc.contributor.authorKo, Young-Jin-
dc.contributor.authorHwang, Gyu Weon-
dc.contributor.authorSeong, Tae-Yeon-
dc.contributor.authorAmano, Hiroshi-
dc.date.accessioned2022-06-10T02:40:55Z-
dc.date.available2022-06-10T02:40:55Z-
dc.date.created2022-06-10-
dc.date.issued2022-07-25-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/141803-
dc.description.abstractIn this study, chlorine (Cl) treatment was carried out on p-AlGaN to enhance the performance of ultraviolet C light emitting diodes (UVC LEDs) by modifying ITO work function and hence reducing the contact resistance of ITO/Al reflector. The Cl-treated UVC LEDs exhibit the forward voltage of 6.88 V at 20 mA, whereas the reference samples show 7.50 V. The light output power and relative wall plug efficiency (WPE) of the Cl-treated UVC LEDs are enhanced by 17.1% at 500 mW and 19.5% at 100 mA, respectively, as compared to the reference. Additionally, the Cl-treated LEDs also display reduction in both the leakage current and ideality factor. Further, the photoluminescence (PL) intensity of AlGaN micro-disks is also enhanced by the Cl-treatment. X-ray photoemission spectroscopy (XPS) results indicate the formation of Cl-ITO at the ITO/p-AlGaN interface and the passivation of the surface states of AlGaN by Cl radicals. Based on the XPS results, a possible mechanism for the improved performance of Cl-treated UVC AlGaN-based LEDs is described and discussed. (c) 2022 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectINDIUM TIN OXIDE-
dc.subjectUV-LEDS-
dc.subjectH3PO4 TREATMENT-
dc.subjectENHANCEMENT-
dc.subjectPASSIVATION-
dc.titleImproved performance of deep ultraviolet AlGaN-based light-emitting diode by reducing contact resistance of Al-based reflector-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1016/j.jallcom.2022.164895-
dc.identifier.scopusid2-s2.0-85128234266-
dc.identifier.wosid000797918000005-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.910-
dc.relation.isPartOfJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume910-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.subject.keywordPlusINDIUM TIN OXIDE-
dc.subject.keywordPlusUV-LEDS-
dc.subject.keywordPlusH3PO4 TREATMENT-
dc.subject.keywordPlusENHANCEMENT-
dc.subject.keywordPlusPASSIVATION-
dc.subject.keywordAuthorUVC LEDs-
dc.subject.keywordAuthorChlorine treatment-
dc.subject.keywordAuthorITO-
dc.subject.keywordAuthorWork function-
dc.subject.keywordAuthorSurface passivation-
dc.subject.keywordAuthorUVC LEDs-
dc.subject.keywordAuthorChlorine treatment-
dc.subject.keywordAuthorITO-
dc.subject.keywordAuthorWork function-
dc.subject.keywordAuthorSurface passivation-
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