Advances in dielectric performance of atomically engineered Sr1.8Bi0.2Nb3O10 perovskite nanosheet thin films
DC Field | Value | Language |
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dc.contributor.author | Yim, Haena | - |
dc.contributor.author | Yoo, So Yeon | - |
dc.contributor.author | Choi, Haneul | - |
dc.contributor.author | Chang, Hye Jung | - |
dc.contributor.author | Hwang, Seong-Ju | - |
dc.contributor.author | Nahm, Sahn | - |
dc.contributor.author | Osada, Minoru | - |
dc.contributor.author | Choi, Ji-Won | - |
dc.date.accessioned | 2022-12-08T11:41:54Z | - |
dc.date.available | 2022-12-08T11:41:54Z | - |
dc.date.created | 2022-12-08 | - |
dc.date.issued | 2022-12-05 | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/146473 | - |
dc.description.abstract | The search for new high-performance dielectric materials has attracted considerable research interest. Several mechanisms to achieve high permittivity have been proposed, such as BaTiO3-based perovskites or CaCu3Ti4O12. However, developing high-performance thin films remains a challenge. Here, we propose a new material design route to achieve high permittivity behavior in atomically thin films. We present a concrete example of Dion-Jacobson-type KSr2-xBixNb3O10 and its cation-exchanged form HSr2-xBixNb3O10, which exhibits a stable colossal permittivity and low dielectric loss. In addition, Sr2(1-x)Bi2xNb3O10-delta na-nosheets were obtained by chemical exfoliation, with a high dielectric permittivity of over 50 0-the highest among all known dielectrics in ultrathin films (< 20 nm). The Bi substitution of Sr2Nb3O10 led to a two-fold increase in the dielectric permittivity owing to the higher polarizability of Bi ions. Our proposed method provides a strategy for obtaining new high-k nanoscale dielectrics for use in nanoscaled electronics.(c) 2022 Published by Elsevier B.V. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | GRAIN-SIZE | - |
dc.subject | DEAD-LAYER | - |
dc.title | Advances in dielectric performance of atomically engineered Sr1.8Bi0.2Nb3O10 perovskite nanosheet thin films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Nahm, Sahn | - |
dc.identifier.doi | 10.1016/j.jallcom.2022.166606 | - |
dc.identifier.scopusid | 2-s2.0-85135726595 | - |
dc.identifier.wosid | 000862935600002 | - |
dc.identifier.bibliographicCitation | JOURNAL OF ALLOYS AND COMPOUNDS, v.925 | - |
dc.relation.isPartOf | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.citation.title | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.citation.volume | 925 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | Y | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.subject.keywordPlus | GRAIN-SIZE | - |
dc.subject.keywordPlus | DEAD-LAYER | - |
dc.subject.keywordAuthor | Perovskite | - |
dc.subject.keywordAuthor | Dielectric | - |
dc.subject.keywordAuthor | Atomic modification | - |
dc.subject.keywordAuthor | Nanosheet | - |
dc.subject.keywordAuthor | Chemical exfoliation | - |
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