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Tunable, High-Performance Switching in Silicon-Oxide(SiOx) Memristor Enabled by a Vertically Integrated Graphene Barristor

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dc.contributor.authorGunuk Wang-
dc.date.accessioned2021-08-27T22:29:44Z-
dc.date.available2021-08-27T22:29:44Z-
dc.date.created2021-04-22-
dc.date.issued2018-07-11-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/18392-
dc.publisher나노기술협의회-
dc.titleTunable, High-Performance Switching in Silicon-Oxide(SiOx) Memristor Enabled by a Vertically Integrated Graphene Barristor-
dc.title.alternativeTunable, High-Performance Switching in Silicon-Oxide(SiOx) Memristor Enabled by a Vertically Integrated Graphene Barristor-
dc.typeConference-
dc.contributor.affiliatedAuthorGunuk Wang-
dc.identifier.bibliographicCitationNANO KOREA (2018)-
dc.relation.isPartOfNANO KOREA (2018)-
dc.relation.isPartOf2018 NANO KOREA 초록집-
dc.citation.titleNANO KOREA (2018)-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2018-07-11-
dc.type.rimsCONF-
dc.description.journalClass2-
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