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Gate-tunable silicon oxide memory based on vertically integrated graphene barristorGate-tunable silicon oxide memory based on vertically integrated graphene barristor

Alternative Title
Gate-tunable silicon oxide memory based on vertically integrated graphene barristor
Authors
Gunuk Wang
Issue Date
5-2월-2018
Publisher
한국반도체산업협회
Citation
The 25th Korean Conference on Semiconductor
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/20316
Conference Name
The 25th Korean Conference on Semiconductor
Place
KO
Conference Date
2018-02-05
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Graduate School > KU-KIST Graduate School of Converging Science and Technology > 2. Conference Papers

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