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Formation of Air Void on Patterned Sapphire Substrate by Selective Photoresist Carbonization

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dc.contributor.authorBYUN, Dong Jin-
dc.date.accessioned2021-08-28T05:48:06Z-
dc.date.available2021-08-28T05:48:06Z-
dc.date.created2021-04-22-
dc.date.issued2017-08-25-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/22822-
dc.publisherThe Materials Science Society of Japan-
dc.titleFormation of Air Void on Patterned Sapphire Substrate by Selective Photoresist Carbonization-
dc.title.alternativeFormation of Air Void on Patterned Sapphire Substrate by Selective Photoresist Carbonization-
dc.typeConference-
dc.contributor.affiliatedAuthorBYUN, Dong Jin-
dc.identifier.bibliographicCitationJapan-Korea Materials Science Technology 2017-
dc.relation.isPartOfJapan-Korea Materials Science Technology 2017-
dc.relation.isPartOfThe 4th japan-Korea International Symposium on Materials Science and Technology-
dc.citation.titleJapan-Korea Materials Science Technology 2017-
dc.citation.conferencePlaceJA-
dc.citation.conferenceDate2017-08-24-
dc.type.rimsCONF-
dc.description.journalClass1-
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