Department of Electro-Mechanical Systems Engineering (전자·기계융합공학과)1,067
Recent Submissions
- On mechanisms to control SiO<sub>2</sub> etching kinetics in low-power reactive-ion etching process using CF<sub>4</sub> + C<sub>4</sub>F<sub>8</sub> + Ar + He plasma
- Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System
- Effects of initial charge on triboelectrification of plastics
- On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF4, CHF3, and C4F8 Gases Mixed with Oxygen
- Noble gas effect on ACL etching selectivity to SiO2 films
- High-aspect-ratio oxide etching using CF4/C6F12O plasma in an inductively coupled plasma etching system with low-frequency bias power
- On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures
- 군중 상호작용을 고려한 학습기반 에이전트 이동 궤적 탐구
- 상태방정식과 메모리를 활용한 강화학습 방법론 탐구
- 제어이론과 딥러닝을 활용한 DC 연금운용 연구
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Subject
- GLOBAL-MODEL31
- SURFACE KINETICS30
- AR27
- HIGH-DENSITY25
- PARAMETERS25
- DISCHARGES22
- MODEL21
- KINETICS20
- MODEL-BASED ANALYSIS20
- MECHANISM19
Date Issued
Type
- Conference728
- Article318
- Book21