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Ultraviolet Stability of Al2O3 Layer Deposited on Crystalline Silicon Surface by Thermal Atomic Layer Deposition Method

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dc.contributor.authorKang Yoon Mook-
dc.date.accessioned2021-08-28T09:42:58Z-
dc.date.available2021-08-28T09:42:58Z-
dc.date.created2021-04-22-
dc.date.issued2017-03-15-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/25050-
dc.publisher한국태양광발전학회-
dc.titleUltraviolet Stability of Al2O3 Layer Deposited on Crystalline Silicon Surface by Thermal Atomic Layer Deposition Method-
dc.title.alternativeUltraviolet Stability of Al2O3 Layer Deposited on Crystalline Silicon Surface by Thermal Atomic Layer Deposition Method-
dc.typeConference-
dc.contributor.affiliatedAuthorKang Yoon Mook-
dc.identifier.bibliographicCitationGPVC 2017-
dc.relation.isPartOfGPVC 2017-
dc.relation.isPartOf한국태양광발전학회-
dc.citation.titleGPVC 2017-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2017-03-15-
dc.type.rimsCONF-
dc.description.journalClass2-
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Graduate School of Energy and Environment (KU-KIST GREEN SCHOOL) > Department of Energy and Environment > 2. Conference Papers

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