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Modeling of electrical characteristics using genetic algorithm for low temperature silicon nitride deposited by inner two parallel cylindrical coil ICPCVD

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dc.contributor.authorPARK KANG-BAK-
dc.date.accessioned2021-08-29T09:49:17Z-
dc.date.available2021-08-29T09:49:17Z-
dc.date.created2021-04-22-
dc.date.issued2014-07-09-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/39528-
dc.publisherKVS-
dc.titleModeling of electrical characteristics using genetic algorithm for low temperature silicon nitride deposited by inner two parallel cylindrical coil ICPCVD-
dc.title.alternativeModeling of electrical characteristics using genetic algorithm for low temperature silicon nitride deposited by inner two parallel cylindrical coil ICPCVD-
dc.typeConference-
dc.contributor.affiliatedAuthorPARK KANG-BAK-
dc.identifier.bibliographicCitationICMAP 2014-
dc.relation.isPartOfICMAP 2014-
dc.relation.isPartOfICMAP 2014 abstract-
dc.citation.titleICMAP 2014-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2014-07-08-
dc.type.rimsCONF-
dc.description.journalClass1-
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과학기술대학 (전자·기계융합공학과)
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