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Characterization of ZnO Film Deposited on Silicon and Polymer Substrates by Atomic Layer Deposition at Low Process Temperatures

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dc.contributor.authorByoung-Ho Choi-
dc.date.accessioned2021-08-29T10:36:29Z-
dc.date.available2021-08-29T10:36:29Z-
dc.date.created2021-04-22-
dc.date.issued2014-06-16-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/39968-
dc.publisherAmerican Vacuum Society-
dc.titleCharacterization of ZnO Film Deposited on Silicon and Polymer Substrates by Atomic Layer Deposition at Low Process Temperatures-
dc.title.alternativeCharacterization of ZnO Film Deposited on Silicon and Polymer Substrates by Atomic Layer Deposition at Low Process Temperatures-
dc.typeConference-
dc.contributor.affiliatedAuthorByoung-Ho Choi-
dc.identifier.bibliographicCitationALD 2014-
dc.relation.isPartOfALD 2014-
dc.relation.isPartOf2014 Atomic Layer Depositon (ALD) Symposium-
dc.citation.titleALD 2014-
dc.citation.conferencePlaceJA-
dc.citation.conferenceDate2014-06-15-
dc.type.rimsCONF-
dc.description.journalClass1-
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공과대학 (기계공학부)
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