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Atomic Layer Deposition (ALD) for Surface and Interface Engineering

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dc.contributor.authorShim, Joon Hyung-
dc.date.accessioned2021-08-29T12:02:20Z-
dc.date.available2021-08-29T12:02:20Z-
dc.date.created2021-04-22-
dc.date.issued2014-04-25-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/40929-
dc.publisher대한기계학회-
dc.titleAtomic Layer Deposition (ALD) for Surface and Interface Engineering-
dc.title.alternativeAtomic Layer Deposition (ALD) for Surface and Interface Engineering-
dc.typeConference-
dc.contributor.affiliatedAuthorShim, Joon Hyung-
dc.identifier.bibliographicCitation2014년도 대한기계학회 열공학부문 춘계학술대회-
dc.relation.isPartOf2014년도 대한기계학회 열공학부문 춘계학술대회-
dc.relation.isPartOfN/A-
dc.citation.title2014년도 대한기계학회 열공학부문 춘계학술대회-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2014-04-23-
dc.type.rimsCONF-
dc.description.journalClass2-
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