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TiO2 thin film in an inductively coupled Ar/Cl2/HBr plasma using neural network modeling

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dc.contributor.authorPARK KANG-BAK-
dc.date.accessioned2021-08-29T16:34:03Z-
dc.date.available2021-08-29T16:34:03Z-
dc.date.created2021-04-22-
dc.date.issued2013-08-28-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/43617-
dc.publisherAJC-APSE-
dc.titleTiO2 thin film in an inductively coupled Ar/Cl2/HBr plasma using neural network modeling-
dc.title.alternativeTiO2 thin film in an inductively coupled Ar/Cl2/HBr plasma using neural network modeling-
dc.typeConference-
dc.contributor.affiliatedAuthorPARK KANG-BAK-
dc.identifier.bibliographicCitationAEPSE 2013-
dc.relation.isPartOfAEPSE 2013-
dc.relation.isPartOfAEPSE 2013 abstract-
dc.citation.titleAEPSE 2013-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlaceKorea(Jeju)-
dc.citation.conferenceDate2013-08-25-
dc.type.rimsCONF-
dc.description.journalClass1-
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과학기술대학 (전자·기계융합공학과)
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