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Control of high performance amorphous indium gallium zinc oxide thin film transistors by N2O plasma treatment,Control of high performance amorphous indium gallium zinc oxide thin film transistors by N2O plasma treatment,
- Alternative Title
- Control of high performance amorphous indium gallium zinc oxide thin film transistors by N2O plasma treatment,
- Authors
- Ju, Byeongkwon
- Issue Date
- 26-8월-2013
- Publisher
- 한국디스플레이산업협회
- Citation
- IMID 2013
- Conference Name
- IMID 2013
- Place
- KO
- Conference Date
- 2013-08-26
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Collections - College of Engineering > School of Electrical Engineering > 2. Conference Papers
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