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Control of dislocation density of GaN used Epitaxial Lateral Overgrowth with carbonized PR mask

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dc.contributor.authorBYUN, Dong Jin-
dc.date.accessioned2021-08-29T16:54:02Z-
dc.date.available2021-08-29T16:54:02Z-
dc.date.created2021-04-22-
dc.date.issued2013-07-03-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/43917-
dc.publisher한국물리학회-
dc.titleControl of dislocation density of GaN used Epitaxial Lateral Overgrowth with carbonized PR mask-
dc.title.alternativeControl of dislocation density of GaN used Epitaxial Lateral Overgrowth with carbonized PR mask-
dc.typeConference-
dc.contributor.affiliatedAuthorBYUN, Dong Jin-
dc.identifier.bibliographicCitationThe 16th International Symposium on the Physics of Semiconductors and Applications-
dc.relation.isPartOfThe 16th International Symposium on the Physics of Semiconductors and Applications-
dc.relation.isPartOfThe 16th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.titleThe 16th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2013-07-02-
dc.type.rimsCONF-
dc.description.journalClass1-
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