Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface
DC Field | Value | Language |
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dc.contributor.author | Min, Kwan Hong | - |
dc.contributor.author | Hwang, Jeong-Mo | - |
dc.contributor.author | Cho, Eunwan | - |
dc.contributor.author | Song, Hee-eun | - |
dc.contributor.author | Park, Sungeun | - |
dc.contributor.author | Rohatgi, Ajeet | - |
dc.contributor.author | Kim, Donghwan | - |
dc.contributor.author | Lee, Hae-Seok | - |
dc.contributor.author | Kang, Yoonmook | - |
dc.contributor.author | Ok, Young-Woo | - |
dc.contributor.author | Kang, Min Gu | - |
dc.date.accessioned | 2021-08-30T05:05:38Z | - |
dc.date.available | 2021-08-30T05:05:38Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2021-01 | - |
dc.identifier.issn | 1062-7995 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/50635 | - |
dc.description.abstract | We investigated field-effect passivation by injecting negative charges into SiO2/SiNx stack using a plasma charge injection technique. The Si/SiO2/SiNx samples exhibited a very high flat-band shift with a high injected negative charge density (>3.0 x 10(13)cm(2)) after plasma negative charge injection; this density was higher than that for the well-known Al2O3 layer. Most injected negative charges were present within approximately 90 nm of the surface of the SiNx layer deposited by plasma-enhanced chemical vapor deposition (PECVD) when comparing the capacitance-voltage analysis results obtained while etching the SiNx film considering four assumptions of the injected negative charge distribution. The saturation current density in a 90-ohm/sq boron emitter decreased from similar to 90 to 50 fA/cm(2) after negative charge injection, which is equivalent to theJ(0e)of the structure passivated with an Al2O3/SiNx stack. Six-inchn-type bifacial cells with an approximately 100-ohm/sq boron emitter passivated with SiO2/SiNx displayed an approximately 0.2% increase in absolute cell efficiency after negative charge injection. In addition,n-PERT bifacial cells with a high boron sheet resistance of similar to 150 ohm/sq exhibited a 1.0% or higher absolute efficiency enhancement from a relatively low precharging efficiency of approximately 19.0%. We also demonstrated that the final efficiency after charging was comparable withn-PERT bifacial cells with Al2O3 passivation, suggesting that the proposed process is a potential low-cost alternative method that could replace expensive Al2O3 processes. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY | - |
dc.subject | SOLAR-CELLS | - |
dc.subject | RECOMBINATION VELOCITY | - |
dc.subject | NITRIDE | - |
dc.subject | CORONA | - |
dc.subject | EMITTERS | - |
dc.subject | ALUMINUM | - |
dc.subject | OXIDE | - |
dc.title | Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Donghwan | - |
dc.contributor.affiliatedAuthor | Lee, Hae-Seok | - |
dc.contributor.affiliatedAuthor | Kang, Yoonmook | - |
dc.identifier.doi | 10.1002/pip.3340 | - |
dc.identifier.scopusid | 2-s2.0-85092055528 | - |
dc.identifier.wosid | 000574857000001 | - |
dc.identifier.bibliographicCitation | PROGRESS IN PHOTOVOLTAICS, v.29, no.1, pp.54 - 63 | - |
dc.relation.isPartOf | PROGRESS IN PHOTOVOLTAICS | - |
dc.citation.title | PROGRESS IN PHOTOVOLTAICS | - |
dc.citation.volume | 29 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 54 | - |
dc.citation.endPage | 63 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Energy & Fuels | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Energy & Fuels | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | SOLAR-CELLS | - |
dc.subject.keywordPlus | RECOMBINATION VELOCITY | - |
dc.subject.keywordPlus | NITRIDE | - |
dc.subject.keywordPlus | CORONA | - |
dc.subject.keywordPlus | EMITTERS | - |
dc.subject.keywordPlus | ALUMINUM | - |
dc.subject.keywordPlus | OXIDE | - |
dc.subject.keywordAuthor | charge distribution | - |
dc.subject.keywordAuthor | charge injection | - |
dc.subject.keywordAuthor | field effect passivation | - |
dc.subject.keywordAuthor | n-PERC cell | - |
dc.subject.keywordAuthor | plasma charging | - |
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