Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Koo, Junmo | - |
dc.contributor.author | Lee, Sangmin | - |
dc.contributor.author | Kim, Junmo | - |
dc.contributor.author | Kim, Dong Hwan | - |
dc.contributor.author | Choi, Byoung-Ho | - |
dc.contributor.author | Kim, Taek-Soo | - |
dc.contributor.author | Shim, Joon Hyung | - |
dc.date.accessioned | 2021-08-30T13:52:55Z | - |
dc.date.available | 2021-08-30T13:52:55Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2020-10 | - |
dc.identifier.issn | 1359-6462 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/53059 | - |
dc.description.abstract | Due to the reduced thickness of thin films formed via atomic layer deposition, analyzing their true mechanical properties is difficult. To overcome this drawback, tensile tests on free-standing alumina thin films floating on water were conducted to measure their mechanical properties. Tensile tests on alumina thin films formed at different deposition temperatures were also conducted; the results indicated that higher Young's modulus and the strength were obtained from thin films formed at higher deposition temperatures. Factors responsible for the variations in mechanical properties were investigated through analyses of the structure, density, and composition of the films. (C) 2020 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | - |
dc.subject | ALUMINUM-OXIDE | - |
dc.subject | FUSED-SILICA | - |
dc.subject | DIELECTRICS | - |
dc.subject | TRANSISTORS | - |
dc.subject | COATINGS | - |
dc.subject | GROWTH | - |
dc.title | Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Choi, Byoung-Ho | - |
dc.contributor.affiliatedAuthor | Shim, Joon Hyung | - |
dc.identifier.doi | 10.1016/j.scriptamat.2020.06.028 | - |
dc.identifier.scopusid | 2-s2.0-85087043281 | - |
dc.identifier.wosid | 000551272900045 | - |
dc.identifier.bibliographicCitation | SCRIPTA MATERIALIA, v.187, pp.256 - 261 | - |
dc.relation.isPartOf | SCRIPTA MATERIALIA | - |
dc.citation.title | SCRIPTA MATERIALIA | - |
dc.citation.volume | 187 | - |
dc.citation.startPage | 256 | - |
dc.citation.endPage | 261 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.subject.keywordPlus | ALUMINUM-OXIDE | - |
dc.subject.keywordPlus | FUSED-SILICA | - |
dc.subject.keywordPlus | DIELECTRICS | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordPlus | COATINGS | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | Atomic layer deposition | - |
dc.subject.keywordAuthor | Alumina | - |
dc.subject.keywordAuthor | Tensile test | - |
dc.subject.keywordAuthor | Thin film | - |
dc.subject.keywordAuthor | Mechanical properties | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.