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트렌치 게이트 하단의 산화막 확장을 통한 트렌치IGBT의 항복전압 향상에 대한연구

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dc.contributor.authorSung, Man Young-
dc.date.accessioned2021-08-30T15:29:49Z-
dc.date.available2021-08-30T15:29:49Z-
dc.date.created2021-04-22-
dc.date.issued2008-11-07-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/53529-
dc.publisher한국전기전자재료학회(KIEEME)-
dc.subjectTIGBT, Breakdown Voltage-
dc.title트렌치 게이트 하단의 산화막 확장을 통한 트렌치IGBT의 항복전압 향상에 대한연구-
dc.title.alternativeA Study on Breakdown Voltage Improvement of the Trench IGBT by Extending a Gate Oxide Region Beneath the Trench Gate-
dc.typeConference-
dc.contributor.affiliatedAuthorSung, Man Young-
dc.identifier.bibliographicCitation2008 한국전기전자재료학회 추계학술대회, pp.74 - 75-
dc.relation.isPartOf2008 한국전기전자재료학회 추계학술대회-
dc.relation.isPartOfProceedings of the KIEEME Annual Autumn Conference 2008-
dc.citation.title2008 한국전기전자재료학회 추계학술대회-
dc.citation.startPage74-
dc.citation.endPage75-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlaceKIST 국제협력관, 서울-
dc.citation.conferenceDate2008-11-06-
dc.type.rimsCONF-
dc.description.journalClass2-
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